Trends and Forecast for the Global EUV Lithography MarketTrends, opportunities and forecast in EUV lithography market to 2026 by light source (laser produced plasma (LPP), vacuum sparks, and gas discharges), equipment (light source, mirror, mask, and others), end use industry (integrated device manufacturers (IDM) and foundry), and region (North America, Europe, Asia Pacific, and the Rest of the World)Lucintel's latest market report analyzed that EUV lithography provides attractive opportunities in the integrated device manufacturers (IDM) and foundry industries. The EUV lithography market is expected to grow with a CAGR of 27% to 29%. In this market, laser produced plasma is the largest segment by light source, whereas IDM is largest by end use industry.
Download Brochure of this report by clicking on https://www.lucintel.com/euv-lithography-market.aspx Based on light source, the EUV lithography market is segmented into laser produced plasma (LPP), vacuum sparks, and gas discharges. The laser produced plasma segment accounted for the largest share of the market in 2020 and is expected to register the highest CAGR during the forecast period, due to growth in the IDM end use industry.
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The EUV Lithography Market is marked by the presence of several big and small players. Some of the prominent players offering EUV lithography include ASML Holding, Nikon Corporation, Canon Inc., Carl Zeiss, Toppan Printing, NTT Advanced Technology, Intel, Samsung, SK Hynix, Toshiba, TSMC, and GLOBALFOUNDRIES.
This unique research report will enable you to make confident business decisions in this globally competitive marketplace. For a detailed table of contents, contact Lucintel at +1-972-636-5056 or click on this link helpdesk@lucintel.com.
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